Nanosolenoid inductor for high frequency application

Zhiqiang Wang,Yifei Mao,Lurui Zhao,Wengang Wu,Jun Xu

DOI: https://doi.org/10.1109/NANO.2013.6720836

IF: 3.5

2013-01-01

Nanotechnology

Abstract:This paper reports the fabrication, measurement and discussion about the nanosolenoid inductors for high frequency applications as much as 40 GHz, taking advantage of a much smaller size compared with traditional microinductors. Three small size nanosolenoid inductors are fabricated, such as a nanosolenoid inductor with a diameter of 4.8 μm, pitch of 10 μm, length of 22 μm. The nanohelix inductors are fabricated using focused ion beam stress introducing technology based on nanobeams, which are obtained by etching the aluminum deposited on SOI substrate. With different focused ion beam fabrication conditions, such as implementing does, etching number, we get different sets of nanosolenoid inductors with different pitches, diameters and solenoid turns. The inductor and quality factor of the nanohelix inductor vary with frequency. The inductanc decrease from 9 pH to an inductance smaller than 1 pH, when the frequency changes from 100 MHz to 40 GHz. And the quality factor of the nanosolenoid inductor first arises from 0.1 at 100 MHz to 0.3 at about 2 GHz, then the quality factor slightly decreases, at last it will arise to about 1.4 at 40 GHz.