The Microstructure and Optical Properties of P-Type Microcrystalline Silicon Thin Films Characterized by Ex-Situ Spectroscopic Ellipsometry

He Zhang,Xiaodan Zhang,Guofu Hou,Changchun Wei,Jian Sun,Xinhua Geng,Shaozhen Xiong,Ying Zhao
DOI: https://doi.org/10.1016/j.tsf.2012.03.081
IF: 2.1
2012-01-01
Thin Solid Films
Abstract:Ex-situ spectroscopy ellipsometry (SE) was applied on the ~25nm thick p-type hydrogenated microcrystalline silicon (p-μc-Si:H) thin films deposited by very high frequency plasma enhanced chemical vapor deposition. Several optical models were built and compared with each other for ex-situ SE data analysis considering both the oxide surface and the heterogeneous bulk condition to reveal the material microstructure and obtain optical function. The SE results imply that the p-μc-Si:H has both an oxide rich surface and the bulk with a flexible amorphous phase, the bandgap of which depends on the gas doping ratio (DR) of B2H6/SiH4. At the same time, we were able to distinguish p-μc-Si:H materials in crystalline volume fraction by ex-situ SE as confirmed by Raman scattering. In this way, we showed the effect of DR on μc-Si:H thin films in microstructural and optical properties.
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