Multi-Step Resistance Memory Behavior in Ge2sb2te5/Gete Stacked Chalcogenide Films

Yifeng Hu,Mingcheng Sun,Sannian Song,Zhitang Song,Jiwei Zhai
DOI: https://doi.org/10.1080/10584587.2012.741367
2012-01-01
Integrated Ferroelectrics
Abstract:The multi-step resistance behavior was observed in the Ge2Sb2Te5/GeTe bistratal stacked films investigated by utilizing in situ temperature-dependent film resistance measurements. The [Ge2Sb2Te5 (30 nm)/GeTe (70 nm)] stacked films had a larger resistance difference among different resistance states. The data retention temperatures for 10 years of amorphous and intermediate states of [Ge2Sb2Te5 (30 nm)/GeTe (70 nm)] films were estimated to be 126 degrees C and 166 degrees C, respectively. X-Ray Diffractomer revealed the changes of phase structure in Ge2Sb2Te5/GeTe bistratal stacked films with different annealing temperature. Theoretical simulation of the temperature distribution of the PCM cell with bistratal films was used to examine the multi-step switching mechanism.
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