Germanium crystals on silicon show their light
F. Pezzoli,F. Isa,G. Isella,C. V. Falub,T. Kreiliger,M. Salvalaglio,R. Bergamaschini,E. Grilli,M. Guzzi,H. von Kaenel,Leo Miglio,C.V. Falub
DOI: https://doi.org/10.48550/arXiv.1306.5270
2013-06-21
Materials Science
Abstract:Germanium and silicon-germanium alloys have found entry into Si technology thanks to their compatibility with Si processing and their ability to tailor electronic properties by strain and band-gap engineering. Germanium's potential to extend Si functionalities, as exemplified by lasing action of strained-Ge on Si substrates, has brought the material back to attention. Yet despite these advances, non-radiative transitions, induced by crystal defects originating from the Ge/Si interface, continue to be a serious bottleneck. Here we demonstrate the drastic emission enhancement achieved via control and mitigation over the parasitic activity of defects in micronscale Ge/Si crystals. We unravel how defects affect interband luminescence and minimize their influence by controlling carrier diffusion with band-gap-engineered reflectors. We finally extended this approach designing efficient quantum well emitters. Our results pave the way for the large-scale implementation of advanced electronic and photonic structures unaffected by the ubiquitous presence of defects developed at epitaxial interfaces.