Visible Light Emission from Crystallized Hydrogenated Amorphous Germanium/silicon Nitride Multiquantum-Well Structures

JG JIANG,KJ CHEN,XF HUANG,ZF LI,D FENG
DOI: https://doi.org/10.1016/0038-1098(94)90881-8
IF: 1.934
1994-01-01
Solid State Communications
Abstract:The a-Ge:H/a-SiN(X):H multiquantum-well structures were prepared by a computer-controlled plasma enhanced chemical vapor deposition method and then crystallized by Ar ion laser annealing technique. When the Ge well-layer thickness was reduced below about 4nm, the crystallized samples showed a room temperature photoluminescence peak at visible wavelength region. Obvious shift of the photoluminescence peak energy by changing the well-layer thickness was observed. A preliminary discussion about the origin of such visible photoluminescence phenomenon was proposed.
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