A Novel Ge Nanostructure Exhibiting Visible Photoluminescence

Jiangong Jiang,Kunji Chen,Xinfan Huang,Duan Feng,Dayou Sun
DOI: https://doi.org/10.1088/0256-307X/10/10/016
1993-01-01
Chinese Physics Letters
Abstract:The a-Ge:H/a-SiN(x):H multiquantum-well structures were prepared by a computer-controlled plasma enhanced chemical vapor deposition method and then crystallized by Ar+ laser annealing technique. When the Ge well-layer thickness was reduced to 30 angstrom, the crystallized sample showed a room temperature photoluminescence with a peak at about 2.26 eV. Meanwhile some significant characteristics of such a novel Ge nanostructure were also revealed by x-ray diffraction. Possible mechanisms of this visible PL phenomenon have been discussed.
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