The Study of the Microstructures in Ar+ Laser Crystallized Asi:H Films for Active Layer of TFT

XF HUANG,XD ZHANG,WY ZHU,YY CHEN
DOI: https://doi.org/10.1117/12.47191
1991-01-01
Abstract:The structural and electrical properties of a-Si:H crystallized films obtained by the Ar+ laser scanning irradiation have been investigated by means of Raman scattering, X-ray diffraction, and conductivity-Hall measurement. For the liquid phase laser crystallized films (LP-LCR) the results show that the average grain size is about tens of micrometers and the preferential crystal orientation is in the direction of <111>. At room temperature the conductivity of crystallized films is 1.5 ((Omega) (DOT)cm)-1 and the Hall mobility of electrons is about 36 cm2/V(DOT)s.
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