KrF Laser-Induced Nanometer Si Crystallites Formation and Tem Observation

Huang Xinfan,National Laboratory for Superlattices and Microstructures,Wu Wei,Chen Xiaoyuan,Li Wei,Hong Ling,Li Qi,National Laboratory for Superlattices and Microstructures
DOI: https://doi.org/10.1557/PROC-397-375
1995-01-01
Abstract:We report the preparation of the nanometer Si crystallites constrained between a-SiNx:H barrier layers by means of KrF excimer laser induced crystallization. X-ray diffraction (XRD) and Raman scattering spectra demonstrate that ultra thin a-Si:H well layers have been crystallized. The average grain size of Si crystallites is on the order of magnitude of a nanometer. Small-angle XRD spectrum indicates multilayer structures have not undergone laser damage. The results of TEM are presented to show smooth and abrupt interfaces of layered structures and nanometer Si crystallites arrayed one-by-one in the Si layer. The thermodynamics of KrF laser-induced crystallization of ultra-thin Si layer has been discussed.
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