Different High-Electric-Field-Stress-Induced Degradation of SiN Passivated AlGaN/GaN HEMTs

Gu Wenping,Hao Yue,Zhang Jincheng,Ma Xiaohua
2008-01-01
Abstract:After different high-electric-field stresses,a recoverable degradation of AlGaN/GaN high electron mobility transistors(HEMTs)was found,consisting of the decrease of saturation drain current IDS,maximal transconductance gm,and the positive shift of threshold voltage VTH at high drain-source voltage VDS.The high-electric-field stress degrades the electric characteristics of AlGaN/GaN HEMTs because the high field increases the trapping at the surface and in AlGaN barrier layer.The SiN passivation of AlGaN/GaN HEMTs decreases the surface trapping and 2DEG depletion a little.After the hot carrier stress with VDS=20 V and VGS=0 V applied to the device for 104 s,the SiN passivation decreases the stress-induced degradation of IDS from 36% to 30%,which shows that although the passivation is effective in suppressing electron trapping in surface states,it does not,perse,protect the device from high-electric-field degradation,and it should,to this aim,be adopted in conjunction with other technological solutions like cap layer,prepassivation surface treatments,and/or field-plate gate.
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