Enhanced Device Performance of GaInN‐based Deep Green Light Emitting Diodes with V‐defect‐free Active Region

T. Detchprohm,M. Zhu,W. Zhao,Y. Wang,Y. Li,Y. Xia,C. Wetzel
DOI: https://doi.org/10.1002/pssc.200880800
2009-01-01
Abstract:We have performed the epitaxial growth of GaInN based deep green (540-570 nm) light emitting diodes (LEDs) by introducing processes to avoid the formation of V-defects in the active region of the GaInN/GaN multiple quantum wells. For 541 and 559 nm LED wafers, the light output power (LOP) at 90 A/cm(2) reaches as high as 14 and 8 mW, respectively. These values are 4 times larger than those of typical deep green LED wafers with average V-defect density of 2-5 x 10(8) cm(-2). Under pulsed operation (pulse width of 50 mu s, duty cycle 1%), the external quantum efficiency exhibits a maximum of 39% at 16 A/cm(2) in 558 nm LED die of size (350 mu m)(2). This type of V-defect-free LED die also shows excellent lifetime behaviour. In 168 hr stress test of 30 mA at 80 degrees C, LOP declines less than 5%. Apparently, eliminating V-defects from the active region significantly enhances the reliability of deep green LEDs. (C) 2009 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
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