Suppression of Si-Ge Interfacial Vibration Mode in the Raman Spectrum of A Si6ge4 Superlattice

C Sheng,TC Zhou,Q Cai,DaweiGong,MR Yu,XJ Zhang,X Wang
DOI: https://doi.org/10.1103/physrevb.53.10771
1996-01-01
Abstract:A thin SiGe buffer layer grown on a Ge-island-decorated Si(100) surface has been prepared and used as the substrate for growing the Si6Ge4 short-period superlattice with symmetrically distributed built-in strains. The Si/Ge superlattice is found to be free of threading dislocations, which is in favor of suppressing the intermixing of Ge and Si atoms at the superlattice interfaces. The Raman spectrum shows a very weak Si-Ge vibration mode, narrow peak widths of the Ge-Ge and Si-Si modes, and the disappearance of the Si optical-phonon mode from the substrate, which are indicative of the great improvement of the interfacial quality.
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