Super thin-film transistor with SOI CMOS performance formed by a novel grain enhancement method

Hongmei Wang,Mansun Chan,Singh Jagar,Vincent M. C. Poon,Ming Qin,Yangyuan Wang,Ping K. Ko
DOI: https://doi.org/10.1109/16.853034
IF: 3.1
2000-01-01
IEEE Transactions on Electron Devices
Abstract:High performance super TFTs with different channel widths and lengths, formed by a novel grain enhancement method, are reported. High temperature annealing has been utilized to enhance the polysilicon grain and improve the quality of silicon crystal after low temperature MILC treatment on amorphous silicon. With device scaling, it is possible to fabricate the entire transistor on a single grain, t...
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