Submicron super TFTs for 3-D VLSI applications

Hongmei Wang,Mansun Chan,S. Jagar,Yangyuan Wang,P. K. Ko
DOI: https://doi.org/10.1109/55.863104
IF: 4.8157
2000-01-01
IEEE Electron Device Letters
Abstract:High performance submicron super TFTs are reported. A novel grain enhancement method is used to form large single grain silicon at the channel region of the TFT, making its structure comparable to SOI MOSFET. The process can be performed with high controllability, thus giving much smaller device-to-device variation compared to conventional TFT process. The reported n-channel super TFT displays a s...
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