Wafer Scale Fabrication Of Carbon Nanotube Thin Film Transistors With High Yield

Boyuan Tian,Xuelei Liang,Qiuping Yan,Han Zhang,Jiye Xia,Guodong Dong,Lian-Mao Peng,Sishen Xie
DOI: https://doi.org/10.1063/1.4958850
IF: 2.877
2016-01-01
Journal of Applied Physics
Abstract:Carbon nanotube thin film transistors (CNT-TFTs) are promising candidates for future high performance and low cost macro-electronics. However, most of the reported CNT-TFTs are fabricated in small quantities on a relatively small size substrate. The yield of large scale fabrication and the performance uniformity of devices on large size substrates should be improved before the CNT-TFTs reach real products. In this paper, 25 200 devices, with various geometries (channel width and channel length), were fabricated on 4-in. size ridged and flexible substrates. Almost 100% device yield were obtained on a rigid substrate with high out-put current (>8 mu A/mu m), high on/off current ratio (>10(5)), and high mobility (>30 cm(2)/V.s). More importantly, uniform performance in 4-in. area was achieved, and the fabrication process can be scaled up. The results give us more confidence for the real application of the CNT-TFT technology in the near future. Published by AIP Publishing.
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