Fabrication and Characterization of Novel Monolayer InN Quantum Wells in a GaN Matrix

A. Yoshikawa,S. B. Che,N. Hashimoto,H. Saito,Y. Ishitani,X. Q. Wang

DOI: https://doi.org/10.1116/1.2957620

2008-01-01

Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena

Abstract:The authors propose and demonstrate fine structure novel InN/GaN multiple quantum wells (MQWs) consisting of ultimately thin InN wells around 1 ML inserted in a GaN matrix grown under In-polarity growth regime by molecular beam epitaxy. Since the critical thickness of InN epitaxy on the c-plane GaN is about 1 ML and also the growth temperature for 1 ML InN insertion can be remarkably higher than conventional one, the proposed MQW structure can avoid new generation of misfit dislocation at the heterointerface, in principle, and results in high quality MQW structure due to the effects of enhanced surface migration at higher temperatures. It is shown that demonstrated 1 ML InN/GaN MQW structures indicate surprisingly higher structural quality/properties than those former-reported InN-based heterostructures. Self-ordering mechanism arising from immiscibility nature in between InN and GaN will also contribute for depositing sharp and atomically flat InN well. The proposed MQW structure has physically and practically important meanings leading to room temperature operating GaN-based excitonic devices and also efficient photonic devices working in short wavelength visible colors.