Elastically Frustrated Rehybridization: Origin of Chemical Order and Compositional Limits in InGaN Quantum Wells

L. Lymperakis,T. Schulz,C. Freysoldt,M. Anikeeva,Z. Chen,X. Zheng,B. Shen,C. Cheze,M. Siekacz,X. Q. Wang,M. Albrecht,J. Neugebauer
DOI: https://doi.org/10.1103/physrevmaterials.2.011601
IF: 3.98
2018-01-01
Physical Review Materials
Abstract:Nominal InN monolayers grown by molecular beam epitaxy on GaN(0001) are investigated combining in situ reflection high-energy electron diffraction (RHEED), transmission electron microscopy (TEM), and density functional theory (DFT). TEM reveals a chemical intraplane ordering never observed before. Employing DFT, we identify a novel surface stabilization mechanism elastically frustrated rehybridization, which is responsible for the observed chemical ordering. The mechanism also sets an incorporation barrier for indium concentrations above 25% and thus fundamentally limits the indium content in coherently strained layers.
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