Microscopic Structure of Al_(0.15)In_(0.01)Ga_(0.84)N/In_(0.2)Ga_(0.8)N and In_(0.2)Ga_(0.8)N/GaN of GaN-based Quantum-well

Hu Xiaodong
2008-01-01
Abstract:GaN-based quantum wells are the core structure of optoelectronic devices such as light-emitting diodes,laser diodes.Our experiments show that,In0.2Ga0.8N/GaN ternary alloys quantum wells and Al0.15In0.01Ga0.84N/In0.2Ga0.8N quaternary alloy quantum wells,two different quantum well structures for laser diode,have significant differences about the electrical properties and luminous efficiency.In this paper,we study on microscopic characteristics of these two different quantum well structure.Through high-resolution X-ray diffraction,we got the satellite peaks of these two different alloys quantum wells by ω/2θ scanning.Using X-ray diffraction,we got the rocking curves by ω scanning of two kinds of MQW's symmetry face(002) and asymmetric face(101),(102),(103),(104),(105) and(201).Through atomic force microscope,photoluminescence spectra and high resolution X-ray diffraction,it revealed the different nature of the macro factors of the In0.2Ga0.8N/GaN ternary alloys and Al0.15In0.01Ga0.84N/In0.2Ga0.8N quaternary alloys.
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