Effects of hydrogen plasma annealing on the luminescence from a-Si:H/SiO2 and nc-Si/SiO2 multilayers

Y RUI,D CHEN,J XU,W LI,Z CEN,X HUANG,K CHEN
DOI: https://doi.org/10.1016/j.apsusc.2007.04.058
IF: 6.7
2007-01-01
Applied Surface Science
Abstract:Effects of post-hydrogen plasma annealing (HPA) on a-Si:H/SiO2 and nc-Si/SiO2 multilayers have been investigated and compared. It is found that photoluminescence (PL) from hydrogen-passivated samples was improved due to the reduction of non-radiative recombination defects. Some interesting difference is that during HPA, atomic hydrogen can directly passivate defects of a-Si:H/SiO2, which results in the reappearance of luminescence band at 760nm, while for nc-Si/SiO2, hydrogen passivation requires additional thermal annealing after nc-Si/SiO2 multilayer was treated by HPA. It is indicated that higher atomic mobility is needed to passivate defects at nc-Si/SiO2 interface compared with a-Si:H/SiO2 interface.
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