Abstract:The Magnetron sputtering method was utilized to apply tantalum-oxide coatings on NiTi shape memory alloys, and this was done under 16.6 vol% oxygen, 83.4 vol% argon atmospheres at a substrate temperature of 300 °C. In the present article, the influence of sputtering rate on surface morphology, roughness, corrosion behavior, and biological response of tantalum oxide coatings has been investigated via FESEM, AFM, potentiodynamic polarization method, and MTT assay, respectively. FESEM studies demonstrated the positive effect of sputtering rate on forming a uniform and dense layer under 0.8 Å s −1 sputtering rate. GI-XRD patterns depicted amorphous coatings in all samples, meaning 300 °C was not sufficient for the formation of crystallized Ta x O y . The XPS results revealed that stoichiometric tantalum pentoxide formed at the top of the layer under 0.8 Å s −1 sputtering rate as there was enough oxygen to support the reaction. AFM 3D images of surface topographies suggested that all coatings possessed almost similar roughness values, but their line graphs showed irregular peaks and valleys for lower and higher sputtering rates. Electrochemical measurements indicated the expected results of supremacy in corrosion resistance for the sample sputtered under 0.8 Å s −1 with the most uniform morphology. Finally, the biocompatibility of the coatings was studied using specific human endothelial cells (HUVECs) to evaluate their potential for vascular applications. Unlike other results, the sample, which sputtered at the highest rate with lots of hills and valleys, showed the greatest cell viability and cellular activity on its surface.

Optical-Electrical Properties and Corrosion Behavior of Tantalum-Doped Indium Tin Oxide Films Deposited by Magnetron Sputtering

Abnormal Behaviors in Electrical Transport Properties of Cobalt-Doped Tin Oxide Thin Films

P-type Tin–indium Oxide Films Prepared by Thermal Oxidation of Metallic InSn Alloy Films

Tuning of Electrical and Optical Properties of Tantalum Doped TiO2 Flims Prepared by Sol-gel Method

I-V Characteristics of High Dielectric Constant Tantalum Oxide Films

Characteristics of Tantalum Oxynitride Films Prepared by Rf Magnetron Sputtering

Annealing effects on the optical and electrochemical properties of tantalum pentoxide films

I-V Characteristics of Tantalum Oxide Film and the Effect of Defects on Its Electrical Properties

Electrical characterization of Ta2O5 films deposited by laser reactive ablation of metallic Ta

A study of the phase transformation of low temperature deposited tantalum thin films using high power impulse magnetron sputtering and pulsed DC magnetron sputtering

Electrical and optical performance of transparent conducting oxide films deposited by electrostatic spray assisted vapour deposition

Pulsed laser deposition of tantalum oxide thin films

Deposition of Tantalum Oxide Films by Uv Laser Reactive Ablation in O-3 Ambient

Effects of Tantalum Concentration on the Microstructures and Mechanical Properties of Tungsten-Tantalum Alloys

Effect of Potassium Ions on Tantalum Chemical Mechanical Polishing in H2O2-Based Alkaline Slurries

Effects of Tantalum Alloying on Surface Morphology and Deuterium Retention in Tungsten Exposed to Deuterium Plasma

Tantalum Coating Prepared by APCVD and In-Vivo Biological Evaluation

Effect of sputtering rate on morphological alterations, corrosion resistance, and endothelial biocompatibility by deposited tantalum oxide coatings on NiTi using magnetron sputtering technique

C-V and Dlts Studies of Al/Ta2o5/N-Si Structures with Ta2o5 Thin Films Deposited by Pulsed Laser Deposition

Effects of powder characteristics and mixing powders on cold sprayability and corrosion properties of tantalum coatings

Study on microstructure, optical and tribological properties of self-formed Ta oxide films