Al2O3 Buffer Layers and Characteristics of Organic Light Emitting Devices Made of Al-Doped ZnO Films

Ning Yao,Hongwei Xing,Huihui Mu,Nana Cui,Yashuang Ge,Yingjian Wang,Binglin Zhang
DOI: https://doi.org/10.3969/j.issn.1672-7126.2011.02.04
2011-01-01
Abstract:The transparent conducting aluminum-doped zinc oxide(AZO) films were deposited by DC reactive magnetron sputtering on the glass substrate.And the prototyped,organic-light-emitting device(OLED),was fabricated with AZO and n-propyl bromide(NPB) layer.The impacts of the film growth conditions on the microstructures and characteristics the OLED with AZO as the anode,were experimentally studied.The resistivity and the average transmittance in the visible range of the AZO films were found to be 5.3×10-4 Ω·cm and 85%,respectively.Interesting finding was that insertion of an Al2O3 buffer layer,1.5 nm in thickness,between the AZO anode and the NBP layer significantly improved the performance of the OLED.For instance,its current efficiency increased 3.4 times,much higher than those of the OLEDs fabricated with either the control AZO,or ITO layers as the anodes.
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