Electrical Properties and Microstructure of Buried Oxide (box) of Simox Studied by Conducting Atomic Force Microscopy (C-Afm)

ZR Song,KW Chen,YH Yu,EZ Luo,DS Shen
DOI: https://doi.org/10.1016/j.tsf.2003.12.095
IF: 2.1
2004-01-01
Thin Solid Films
Abstract:The nanometer-scale interface morphology of top Si/buried oxide in SIMOX (separation by implantation of oxygen) and the influence of nano-size Si clusters to the electronic properties of the buried oxide (BOX) layer were studied by Conducting Atomic Force Microscopy (C-AFM). With C-AFM, the interface morphology and the current–voltage (I–V) curves of the BOX can be obtained simultaneously. The results found that the interface of Si/BOX in SIMOX had a very smooth surface morphology and there were some nanometer-size Si clusters distributed in the BOX, forming conducting channels. Furthermore, the high-resolution transmission electron microscope (HRTEM) and spreading resistance probe (SRP) were used to characterize the BOX.
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