Parameter-free extraction of Thin-Film Dielectric Constants from Scanning Near Field Microwave Microscope Measurements

Shuogang Huang,H. M. Christen,M. E. Reeves
DOI: https://doi.org/10.48550/arXiv.0909.3579
2009-09-19
Materials Science
Abstract:We present a method for extracting high-spatial resolution dielectric constant data at microwave frequencies. A scanning near field microwave microscope probes a sample and acquires data in the form of the frequency and quality factor shifts of a resonant cavity coupled to the sample. The approach reported here is to calculate the electromagnetic fields by the finite element method in both static and time-dependent modes. Cavity perturbation theory connects the measured frequency shifts to changes in the computed energy stored in the electromagnetic field. In this way, the complex permittivity of the sample is found. Of particular interest are thin-film materials, for which a method is reported here to determine the dielectric constant without the need to use any fitting parameters.
What problem does this paper attempt to address?