Abstract:In this paper, microwave near-field scanning technique has been employed to study the local dielectric properties of the substrate materials for superconducting microwave devices. A coaxial cavity together with a niobium tip has been used as a probe in our scanning microwave near-field microscope (SMNFM). Using the SMNFM, quantitative measurement of both the relative permittivity and the loss tangent of various substrate materials for the high-temperature superconducting thin films have been obtained, which coincide with the data reported in the literature quite well. Nondestructive imaging of the dielectric properties of the substrate is also given with a spatial resolution of several micrometres. We believe that the SMNFM is a reliable method for nondestructively evaluating the dielectric properties of the substrates in the microwave circuit devices. It will be helpful to better understand the influences of the variations and defects in the substrates on the designing and performance of the superconducting microwave devices.

Nondestructive Imaging of the Microwave Properties of Superconducting Thin Film Devices with a Scanning Microwave Near-Field Microscope

Probing the Local Microwave Properties of Superconducting Thin Films by a Scanning Microwave Near-Field Microscope

Spatially Resolved Characterization of the Microwave Properties of Superconducting Thin Films by Low Temperature Microwave Scanning Near-Field Microscopy

Nondestructive Evaluation of the Dielectric Properties of the Substrate Materials for High-T-C Superconducting Microwave Devices

Superconducting Material Diagnostics using a Scanning Near-Field Microwave Microscope

Local microwave characterization of metal films using a scanning microwave near-field microscope

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Nondestructive Imaging of Dielectric-Constant Profiles and Ferroelectric Domains with a Scanning-Tip Microwave Near-Field Microscope

Temperature-dependent local electromagnetic characterization of electronic materials by scanning microwave near-field technique

Microwave Atomic Force Microscopy Imaging for Nanometer-Scale Electrical Property Characterization.

Local Permittivity Measurement of Dielectric Materials Based on the Non-Contact Force Curve of Microwave Atomic Force Microscopy

Quantitative Evaluation of Local Permittivity of Semiconductor Nanomaterials Using Microwave Atomic Force Microscopy

Frequency Following Imaging of Electric Fields from Resonant Superconducting Devices using a Scanning Near-Field Microwave Microscope

Penetrative Imaging Of Sub-Surface Microstructures With A Near-Field Microwave Microscope

C105 Nondestructive Evaluation of SCC Depth on the Ni-Base Alloy by Microwaves

C208 Nondestructive Evaluation of SCC on the Surface of Ni-Base Alloy by Microwaves

Nonlinear Near-Field Microwave Microscope For RF Defect Localization in Superconductors

Nondestructive inspection of delamination in IC packages by high-frequency microwaves

Modeling the nanoscale linear response of superconducting thin films measured by a scanning probe microwave microscope

Atomic-force-microscope-compatible Near-Field Scanning Microwave Microscope with Separated Excitation and Sensing Probes