Charge Storage Characteristics in Al/AlN/Si Metal–insulator–semiconductor Structure Based on Deep Traps in AlN Layer
Y.C. Kong,L.Q. Hu,Y.D. Zheng,C.H. Zhou,C. Chen,S.L. Gu,R. Zhang,P. Han,R.L. Jiang,Y. Shi
DOI: https://doi.org/10.1007/s00339-007-4319-8
2007-01-01
Abstract:Charge storage characteristics in an Al/AlN/p-Si metal–insulator–semiconductor (MIS) structure have been investigated by capacitance–voltage and long-term capacitance measurements. Good program/erase behavior is observed in the AlN/Si structure, which is attributed to the trapping and detrapping of charges in deep traps of the AlN layer. In the long-term retention mode, a clear memory window is found 2000 s after removing a program/erase voltage of ±3 V, indicating good charge retention capability of the MIS structure. Further investigation shows that for a program pulse width of 500 ms, the charge storage does not occur when the pulse amplitude is smaller than a threshold value of ∼1 V. The trapped charge density increases linearly with increase of the pulse amplitude (>1 V) and tends to saturate at 2.5 V. With increasing program pulse width, the trapped charged density increases a little more than logarithmically.