Three-dimensional integrated metal-oxide transistors

Saravanan Yuvaraja,Hendrik Faber,Mritunjay Kumar,Na Xiao,Glen Isaac Maciel García,Xiao Tang,Thomas D. Anthopoulos,Xiaohang Li
DOI: https://doi.org/10.1038/s41928-024-01205-0
IF: 33.255
2024-07-09
Nature Electronics
Abstract:Nature Electronics, Published online: 08 July 2024; doi:10.1038/s41928-024-01205-0 A room-temperature approach to monolithic three-dimensional thin-film integration can be used to stack ten layers of n-channel indium oxide transistors on silicon/silicon dioxide substrates, while incorporating a range of architectures.
engineering, electrical & electronic
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