Investigation about the effect of trace oxygen on the plasma nitriding of titanium foil

Hai-Tao Zhou,Xi-Ya Xiong,Ke-Xin Ma,Bing-Wei Luo,Fei Luo,Cheng-Min Shen
DOI: https://doi.org/10.1088/1674-1056/ad35b0
2024-03-21
Chinese Physics B
Abstract:Titanium nitride films are prepared by plasma enhanced chemical vapor deposition method on titanium foil using N 2 as precursor. In order to evaluate the effect of oxygen on the growth of titanium nitride films, a small amount of O 2 is introduced into the preparation process. The study indicates that trace O 2 addition into the reaction chamber gives rise to significant changes on the color and micro-morphology of the foil, featuring dense and long nano-wires. The as-synthesized nanostructures are characterized by various methods and identified as TiN, Ti 2 N and TiO 2 respectively. Moreover, the experiment results show that oxide nanowire has a high degree of crystallinity and the nitrides present specific orientation relationships with the titanium matrix.
physics, multidisciplinary
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