Abstract:High-density nitrogen plasma was produced using a high-power pulsed power modulator to sputter titanium targets for the preparation of titanium nitride film. The high-power pulsed sputtering discharge unit consisted of two targets facing each other with the same electrical potential. The titanium target plates were used as target materials with dimensions of 60 mm length, 20 mm height, and 5 mm thickness. The gap length was set to be 10 mm. The magnetic field was created with a permanent magnet array behind the targets. The magnetic field strength at the gap between the target plates was 70 mT. The electrons were trapped by the magnetic and electric fields to enhance the ionization in the gap. The nitrogen and argon gases were injected into the chamber with 4 Pa gas pressure. The applied voltage to the target plates had an amplitude from −600 V to −1000 V with 600 μs in pulse width. The target current was approximately 10 A with the consumed power of 13 kW. The discharge sustaining voltage was almost constant and independent of the applied voltage, in the same manner as the conventional normal glow discharge. The ion density and electron temperature at the surface of the ionization region were obtained as 1.7 × 1019 m−3 and 3.4 eV, respectively, by the double probe measurements. The vertical distribution of ion density and electron temperature ranged from 1.1 × 1017 m−3 (at 6 cm from the target edge) to 1.7 × 1019 m−3 and from 2.4 eV (at 6 cm from the target edge) to 3.4 eV, respectively. From the emission spectra, the intensities of titanium atoms (Ti I), titanium ions (Ti II), and nitrogen ions (N2+) increased with increasing input power. However, the intensities ratio of Ti II to Ti I was not affected by the intensities from N2+.

Reactive nitrogen plasma spray coating of titanium nitride: plasma torch design and coating analysis

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Improving the Efficiency of Air Plasma Spraying of Titanium Nitride Powder

Nitrogen species in a thermal plasma under very low pressure (150 Pa): Application to reactive plasma spraying

Production of High-Power Nitrogen Sputtering Plasma for TiN Film Preparation

Synthesis of nanocrystalline titanium nitride coatings from the plasma of a composite-cathode arc discharge

Influence of Plasma Arc Current and Gas Flow on the Structural and Tribological Properties of TiN Coatings Obtained by Plasma Spraying

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Preparation and Characterization of Multilayer NiTi Coatings by a Thermal Plasma Process

Investigation on the Performance of TiN Coatings by Reactive Plasma Spraying Crystallization

The Crystallization Mechanism of Reactive Plasma Spraying

Microstructure and Mechanical Properties of Titanium Nitride Coatings for Cemented Carbide Cutting Tools by Pulsed High Energy Density Plasma

Plasma Nitridation and Mechanical Properties of Pure Titanium Casts

Evaluation of titanium nitride/titanium aluminum nitride thin film coating, plasma nitriding on AISI 304 stainless steel using the plasma-assisted physical vapor deposition process, and thermal stress investigated through finite-element analysis

Low Temperature Deposition of TiN Using Tetrakis(dimethylamido)‐Titanium in an Electron Cyclotron Resonance Plasma Process

Mechanical Properties Evaluation and Parametric Optimization of Atmospheric Plasma Spray NiTi Coating

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Thermochemical Processes Occurring in a Titanium Nitride Coating under the Effect of Thermal Laser Pulses

Preparation of ultra-thick, crack-free, titanium nitride coatings using a full-domain power-modulated laser