Abstract:Utilizing reactive DC magnetron sputtering method, TiN coatings were deposited on the silicon substrates at different nitrogen flows and powers. A study of the X-ray phase composition of the coatings was carried out. The stoichiometric composition of the coatings was determined using energy dispersive x-ray spectroscopy. The structure of the surface, cross-section, and thickness of the coatings were determined using scanning electron (SEM) and atomic force microscopy (AFM). A significant change in the surface structure of TiN coatings was established with changes in deposition power and nitrogen flow. SEM images of cross-sections of all coated samples showed that the formation of coatings occurs in the form of a columnar structure with a perpendicular orientation relative to the silicon substrate. The mechanical properties (elastic modulus E and microhardness H) of TiN coatings of the first group demonstrate a maximum at a nitrogen flow of 3 sccm and are 184 ± 11 GPa and 15.7 ± 1.3 GPa, respectively. In the second group, the values of E and H increase due to a decrease in the size of the structural elements of the coating (grains and crystallites). In the third group, E and H decrease. Microtribological tests were carried out in 4 stages: at a constant load, multi-cycle for 10 and 100 cycles, and with increasing load. The coefficient of friction (CoF) and specific volumetric wear ω depend on the roughness, topology, and mechanical properties of the resulting coatings. Fracture toughness was determined using nanoscratch and depends on the mechanical properties of TiN coatings. Within each group, coatings with the best mechanical and microtribological properties were described: in the first group-TiN coating at 3 sccm (with (29.6 ± 0.1) at.% N), in the second group-TiN coating at 2 sccm (with (40.8 ± 0.2) at.% N), and in the third group-TiN coating at 1 sccm (c (37.3 ± 0.2) at.% N).

Effect of N2 Mass Flow Rate On the Optical Property of Titanium Nitride Films Deposited by Magnetron Sputtering

Morphology and Physical Properties of Titanium Nitride Films Deposited by Magnetron Sputtering at Room Temperature

Effects of Ion Flux Density and Energy on the Composition of TiNx Thin Films Prepared by Magnetron Sputtering with an Anode Layer Ion Source

Study of optical and electrical properties of TiN thin films prepared by cathodic ion sputtering

Structure and Properties of Nitrogen-Doped Titanium Dioxide Thin Films Grown by Atmospheric Pressure Chemical Vapor Deposition

Evolution of chemical, structural, and mechanical properties of titanium nitride thin films deposited under different nitrogen partial pressure

Electrical and optical properties of titanium nitride coatings prepared by atmospheric pressure chemical vapor deposition

Effect of Sputtering Current on the Structure of Titanium Nitride Thin Film Deposited by Reactive DC Magnetron Sputtering

Structure, Electrical and Optical Properties of TiNx Films by Atmospheric Pressure Chemical Vapor Deposition

Study on the Electrical and Optical Properties of Vanadium Doped TiN Thin Films Prepared by Atmospheric Pressure Chemical Vapor

Effects of nitrogen content on structure and mechanical properties of multi-element (AlCrNbSiTiV)N coating

Study of Titanium Nitride for Low-E Coating Application

EFFECT OF SPRAYING DISTANCE ON THE PROPERTIES OF TITANIUM NITRIDE FILMS PREPARED BY ATMOSPHERIC PRESSURE CHEMICAL VAPOR DEPOSITION

The Structure and Properties of V Doped TiN Films Prepared at Various Temperatures

Investigation of microstructure evolution in Pt-doped TiO2 thin films deposited by rf magnetron sputtering

Effect of nitrogen flow ratio on the structure and optical properties of AlN film

Effects of Nitrogen Ion Implantation and Implantation Energy on Surface Properties and Adhesion Strength of TiN Films Deposited on Aluminum by Magnetron Sputtering

Effects of nitrogen content on microstructures and mechanical properties of (AlCrTiZrHf)N high-entropy alloy nitride films

The Influence of Nitrogen Flow on the Stoichiometric Composition, Structure, Mechanical, and Microtribological Properties of TiN Coatings

Influence of Deposition Parameters on Structural and Electrochemical Properties of Ti/Ti2N Films Deposited by RF-Magnetron Sputtering

Investigation of Nitrogen Doped TiO2 Photocatalytic Films Prepared by Reactive Magnetron Sputtering