Investigation of Nitrogen Doped TiO2 Photocatalytic Films Prepared by Reactive Magnetron Sputtering

SZ Chen,PY Zhang,WP Zhu,DM Zhuang
DOI: https://doi.org/10.1016/j.catcom.2004.08.011
2004-01-01
CHINESE JOURNAL OF CATALYSIS (CHINESE VERSION)
Abstract:Nitrogen doped titanium oxide films were loaded on aluminum substrates by reactive magnetron sputtering with O2/N2 mixture as reactive gas. Surface molecularly chemisorbed N2, doped N3− and solid solution N2 were found in the films by XPS experiments. The properties of the films, including crystallinity, surface morphology and light absorption capability are influenced by the O2/N2 ratio of reactive gas, while the photocatalytic activity is determined by the amount of doped N3− in the film. The film with optimum activity, which is about 1.5 times of that of pure TiO2 film, was obtained at N2/(O2+N2)=80%, with concentration of doped N3− to be 0.594 at.%.
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