Abstract:Nitrogen-doped TiO2 films exhibit good photocatalytic ability in the visible (VIS) light region. This study reports the fabrication of these films using arc ion plating (AIP) in different ratios of nitrogen partial pressure (PN2) to oxygen partial pressure (PO2) without substrate heating and/or applied bias. This approach allows a significant broadening of the range of possible substrates to be used. X-ray diffraction (XRD) patterns indicate that these films deposited at room temperature are amorphous, and surface electron microscope (SEM) and atomic force microscope (AFM) images show that they have rough surfaces. Their transmittance and optical properties are measured with a spectrometer and ellipsometer, respectively. In addition, the bandgap energies of these amorphous films are derived by the ellipsometer from the Tauc–Lorentz (TL) model. The results indicate that the N-doped TiO2 film with a PN2/PO2 ratio of 1/4 attains the narrowest bandgap and the highest absorbance in the visible region. It can be attributed to the prominent Ti–N peaks observed in the sample's Ti and N X-ray photoelectron spectroscopy (XPS) spectra. In addition, verified with the methylene blue (MB) test, this sample exhibits the best photocatalytic performance for its narrowest energy gap.

Microstructures and Properties of N-Doped TiO_2 Films Grown by Atmospheric Pressure Chemical Vapor Deposition

Investigation of structure and properties of N-doped TiO2 thin films grown by APCVD

Microstructures and Properties of N-Doped TiO_2 Films Grown by Dielectric Barrier Discharge Chemical Vapor Deposition

Preparation and Properties of N -Doped TiO2 Films by APCVD

Structure and Properties of Nitrogen-Doped Titanium Dioxide Thin Films Grown by Atmospheric Pressure Chemical Vapor Deposition

Microstructure and Properties of N-Doped TiO_2 Films Grown by Dielectric Barrier Discharge Enhanced Chemical Vapor Deposition（DBD-CVD）

The Development of TiO2 Films and the Properties of N-doped TiO2 Films Prepared by APCVD

Facile Fabrication of N-doped TiO2 Nanocatalyst with Superior Performance under Visible Light Irradiation

Study on the Electrical and Optical Properties of Vanadium Doped TiN Thin Films Prepared by Atmospheric Pressure Chemical Vapor

The Structure and Properties of V Doped TiN Films Prepared at Various Temperatures

Photoelectrochemical and Optical Properties of N-doped TiO2 Thin Films Prepared by Oxidation of Sputtered TiNx Films

Electrical and optical properties of titanium nitride coatings prepared by atmospheric pressure chemical vapor deposition

Structure, Electrical and Optical Properties of TiNx Films by Atmospheric Pressure Chemical Vapor Deposition

First Principles Calculations of the Electronic Structure and Optical Properties of Pure and (nb, N) Co-Doped Anatase

Preparation and photocatalysis property of N-doped TiO2 film

Study of Titanium Nitride for Low-E Coating Application

Visible Light Photoreduction Properties of N-Doped TiO<sub>2</sub> Nanostructured Films

TiNx Thin Films for Energy-Saving Application Prepared by Atmospheric Pressure Chemical Vapor Deposition

Characterization of Nitrogen-Doped TiO2 Films Prepared by Arc Ion Plating without Substrate Heating in Various N2/O2 Gas Mixture Ratios

APCVD Prepared TiNxOy Films with Energy-Saving and Self-Cleaning Functions

Microporous Textured Titanium Dioxide Films Deposited at Atmospheric Pressure Using Dielectric Barrier Discharge Assisted Chemical Vapor Deposition