Abstract:We obtained Ti1-xNxO2 (TNO) by doping Nb to TiO2. TNO transparent conducting film was fabricated by reactive midfrequency (MF) twinmagnetron sputtering method with assistance of a multicell anode layer ion sources, and the sputtering process was controlled by plasma emission monitor (PEM). The films were characterized by Xray diffraction (XRD), atomic force morphology (AFM), spectroscopic ellipsometry, spectrophotometer and xray photoelectron spectroscopy (WS). The behaviors of the carrier concentration and mobility of TNO thin films were investigated by means of the Hall technique.The results demonstrate that the reactive process can be controlled stably during the metaloxide transition with monitor of PEM, and the disadvantages of titanium target poison and anode disappear were also successfully overcome. Polycrystalline TNO thin films with 0.03 <= x <= 0.06 show a resistivity (rho) of lower than 2.0X103 Omega cm, and internal optical transmittance higher than 90% at 600 nm. The firstprinciple band calculations demonstrate that Ti2p, Nb3d and Ti3d states are strongly hybridized with each other to form dnature conduction band, substituted Nb atoms are ionized and release electrons into the hybridized conduction band without forming midgap state.

TiNx Thin Films for Energy-Saving Application Prepared by Atmospheric Pressure Chemical Vapor Deposition

Structure, Electrical and Optical Properties of TiNx Films by Atmospheric Pressure Chemical Vapor Deposition

APCVD Prepared TiNxOy Films with Energy-Saving and Self-Cleaning Functions

Study of Titanium Nitride for Low-E Coating Application

Study of optical and electrical properties of TiN thin films prepared by cathodic ion sputtering

Electrical and optical properties of titanium nitride coatings prepared by atmospheric pressure chemical vapor deposition

APPLICATION AND OPTICAL PROPERTIES OF TiO_2 THINFILMS PREPARED BY CHEMICAL VAPOUR DEPOSITION

Study on the Electrical and Optical Properties of Vanadium Doped TiN Thin Films Prepared by Atmospheric Pressure Chemical Vapor

Microstructures and Properties of N-Doped TiO_2 Films Grown by Atmospheric Pressure Chemical Vapor Deposition

Investigation of structure and properties of N-doped TiO2 thin films grown by APCVD

The Structure and Properties of V Doped TiN Films Prepared at Various Temperatures

Control of optical properties of TiN x O y films and application for high performance solar selective absorbing coatings

A Study on the Preparation of Tio2-Xnx Films by Reactive Deposition and Their Absorption Properties in Visible Region

Structure and Properties of Nitrogen-Doped Titanium Dioxide Thin Films Grown by Atmospheric Pressure Chemical Vapor Deposition

The Preparation of TiO_(2-x)N_x(0<x<1) Thin Films by Sol-Gel Method and Its Photocatalysis and Hydrophilic Properties

Preparation and Properties of N -Doped TiO2 Films by APCVD

Structure and Energy Saving Performance of TiN Films Prepared by Atomspheric Pressure Chemical Vapor Deposition

Nitrogen-doped TiO2 from TiN and its visible light photoelectrochemical properties

Reactive Twin-Magnetron Sputtering Of Ti1-Xnbxo2 Transparent Conducting Oxide Films

Infrared enhanced absorption of TiNx nano films.

Microstructures and Properties of N-Doped TiO_2 Films Grown by Dielectric Barrier Discharge Chemical Vapor Deposition