The Structure and Properties of V Doped TiN Films Prepared at Various Temperatures

WU Ling,ZHAO Gao-ling,DUAN Gang-feng,WANG Jian-xun,HAN Gao-rong
2011-01-01
Journal of Functional Biomaterials
Abstract:Vanadium(V) doped titanium nitride(TiN) films were prepared by the atmospheric pressure chemical vapor deposition process in glass substrates.The effect of the deposition temperature on the structure,morphology,electrical and optical properties of the films were investigated by X-ray diffraction(XRD),optoelectronic spectrometer(XPS),field emission scanning electron microscope(SEM),four point probe and ultraviolet-visible spectrometer.The results showed that the films were typical of granular structure.With increasing deposition temperature,the crystallinity improved,the proportion of V increased and the sheet resistance decreased.When the temperature is 600℃,the reflectivity of V doped TiN film in the near-infrared and medium-far infrared region are 50% and 93.74% respectively.We obtained TiN coating glass with both sunlight control function and low radiation function.
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