MoS 2 Field-Effect Transistor Performance Enhancement by Contact Doping and Defect Passivation via Fluorine Ions and Its Cyclic Field-Assisted Activation

Anand Kumar Rai,Asif A. Shah,Jeevesh Kumar,Sumana Chattaraj,Aadil Bashir Dar,Utpreksh Patbhaje,Mayank Shrivastava
DOI: https://doi.org/10.1021/acsnano.3c09428
IF: 17.1
2024-02-14
ACS Nano
Abstract:MoS(2)-based field-effect transistors (FETs) and, in general, transition metal dichalcogenide channels are fundamentally limited by high contact resistance (R(C)) and intrinsic defects, which results in low drive current and lower carrier mobilities, respectively. This work addresses these issues using a technique based on CF(4) plasma treatment in the contacts and further cyclic field-assisted drift and activation of the fluorine ions (F^(-)), which get introduced into the contact region during...
materials science, multidisciplinary,chemistry, physical,nanoscience & nanotechnology
What problem does this paper attempt to address?