GaN nanowires prepared by Cu-assisted photoelectron-chemical etching

Qi Wang,Wen Yang,Sheng Gao,Weizhong Chen,Xiaosheng Tang,Hongsheng Zhang,Bin Liu,Genquan Han,Yi Huang
DOI: https://doi.org/10.1039/d2na00889k
IF: 5.598
2023-01-01
Nanoscale Advances
Abstract:A Cu-assisted photoelectron-chemical etching is proposed to fabricate GaN nanowires. The functional mechanism of assisted metals, etchant concentrations, and the addition of H 2 O 2 has been investigated based on theoretical analysis and experiments.
materials science, multidisciplinary,nanoscience & nanotechnology,chemistry
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