High-yield GaN Nanowire Synthesis and Field-Effect Transistor Fabrication

Huaqiang Wu,Ho-Young Cha,M. Chandrashekhar,Michael G. Spencer,Goutam Koley
DOI: https://doi.org/10.1007/s11664-006-0118-9
IF: 2.1
2006-01-01
Journal of Electronic Materials
Abstract:This letter describes a simple way to grow high-quality GaN nanowires in a specific area. The relationship between catalyst formation and nanowire growth was addressed. High-yield gallium nitride nanowire field-effect transistors were demonstrated successfully using a prealigned process: Ni catalysts with a diameter of 200 nm were deposited selectively at predetermined positions. GaN nanowires were then grown by vapor-liquid-solid mechanism in a chemical vapor deposition (CVD) reactor. Fabricated GaN nanowire FETs showed a high current density along with good saturation and pinch-off characteristics.
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