Growth of GaN Nanowires on Graphene

Dingding CHEN,Lin CHEN,Xiangqian XIU,Yuewen LI,Runding FU,Xuemei HUA,Zili XIE,Bin LIU,Peng CHEN,Rong ZHANG,Youdou ZHENG
DOI: https://doi.org/10.16818/j.issn1001-5868.2017.06.010
2017-01-01
Abstract:In this paper,GaN nanowires were grown on substrates with the graphene insert layer by chemical vapor deposition (CVD) technology at atmosphere pressure.The effects of growth temperature,graphene insert layer,catalyst on the morphology,optical properties and structures of GaN nanowires were studied systematically.The morphology,optical properties and structures of GaN nanowires were characterized by scanning electron microscopy (SEM),photoluminescence (PL),Raman spectra and transmission electron microscopy (TEM).The results show that low-stress and single crystal GaN nanowires can be grown on the substrates which both have graphene insert layer and catalyst at 1 100 ℃.Graphene insert layer and catalyst play an important role in obtaining low-stress and single crystal GaN nanowires.
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