Fabrication of GaAs Nanowires by Colloidal Lithography and Dry Etching

Ke Chen,Mingyu Li,Jian-Jun He,Ray LaPierre
DOI: https://doi.org/10.1088/0256-307x/29/3/036105
2011-01-01
Abstract:A method for the fabrication of large-area well-ordered periodic GaAs nanowires have been developed based on colloidal lithography and a two-step inductively coupled plasma (ICP) etching. The reflectance spectra of the GaAs nanowire samples are measured and compared with nanowires fabricated by using molecular beam epitaxy.
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