Optimization of Anti-Reflective GaAs Nano-Rods on Solar Cells

nan liu,yu hu,jianjun he

DOI: https://doi.org/10.1364/ACPC.2014.ATh1J.5

2014-01-01

Abstract:A method of fabricating nano-rods on GaAs wafer using colloidal lithography and ICP dry etching is presented. The effect of diameter on anti-reflection performance is simulated, and experimentally investigated. A low reflectivity of 11.1% is measured.

What problem does this paper attempt to address?

Low Reflectance Gaas Nano-Cones Fabricated By Colloidal Lithography For Solar Cells

Nan Liu,Yu Hu,Jian-Jun He

2014-01-01

Abstract:In this paper, we demonstrate a new method of fabricating large-area well-ordered nano-cones using colloidal lithography and inductively coupled plasma (ICP) dry etching, and discuss the anti-reflectance performance. In the fabrication, we use SiO2 nano-particles as the mask. Its selectivity in different reacting gases in ICP can result in different shapes of nanostructures. Before the etching, we use methanol-assisted self-assembly at the air/water interface to form the patterns. Different ICP etching recipes are used to form rod-shaped and cone-shaped nanowires with the same height and period. The resultant nano-cone structures are well-shaped with smooth side walls. After the fabrication, the anti-reflection performance is measured and compared, which shows that cone-shaped nanowires can reduce the surface reflection to lower than 4% over the wavelength range of 400-900 nm, while nano-rods can only keep this value at approximately 6%. Theoretical simulations are also carried out using Comsol, which confirm that nano-cones provide better anti-reflectance performance.
Design and analysis of one-dimensional nanostructure on amorphous silicon solar cell for surface reflectance reduction

Yang Li,Xiaodong Zheng,Linfang Shen

DOI: https://doi.org/10.4028/www.scientific.net/AMR.311-313.1300

2011-01-01

Abstract:In this paper, we design a one-dimensional (1-D) a-Si nanostructure, orthogonizing the two processes to avoid their competition. Shapes of the structure include 1-D nanowire and 1-D nanocone. With the method of plane-wave expansion, the influence of different parameters on surface reflectance is systematically discussed. It is verified that, under the given geometrical parameters, 1-D nanocone solar cell will perform better than 1-D nanowire one and flat one in optical absorption enhancement.
Optimization of GaAs Nanowire Array for Solar Cells

Y. Hu,R. R. LaPierre,M. Li,K. Chen,J-J He

DOI: https://doi.org/10.1364/acpc.2012.af4b.36

2012-01-01

Abstract:The reflectance, transmittance and absorptance of GaAs nanowire (NW) arrays are calculated by solving Maxwell's equations using the finite element method. The model is compared with measurement results from well-ordered periodic GaAs NW arrays fabricated by dry etching. The model results are also compared with the reflectance measured from NWs grown by the Au-assisted vapor-liquid-solid (VLS) method. The optimum NW diameter, periodicity (spacing between NWs) and length are determined to maximize absorptance of the AM1.5G solar spectrum and short circuit current density in a NW array solar cell. The geometry structure of GaAs-Si two junction solar cell is also determined.
Wide-angle Broadband Antireflection with Nano-taper Hydrated Alumina Film

Hailan Wang,Weidong Shen,Chenying Yang,Yueguang Zhang,Tingting Zheng

DOI: https://doi.org/10.1364/oic.2022.md.10

2022-01-01

Abstract:Wide-angle and broadband antireflection coating is proposed including the nano-tapered Al2O3•xH2O structure and high-low index multilayer film. The average reflectance values for 400-1100nm are 0.40% and 3.13% at AOI of 6° and 60°.
Anti-reflection Coating at 550 Nm Fabricated by Atomic Layer Deposition

Yanghui Li,Weidong Shen,Yueguang Zhang,Xiang Hao,Huanhuan Fan,Xu Liu

DOI: https://doi.org/10.3788/col201311.s10205

IF: 2.56

2013-01-01

Chinese Optics Letters

Abstract:Trimethylamine (TMA), TiCl4, and water are applied as the precursors to deposit Al2O3 and TiO2. With different substrate temperatures, the optical properties and surface morphologies of the two oxides TiO2 and SiO2 are studied, respectively. With substrate temperature of 120 oC, amorphous TiO2 can be obtained, and the surface roughness (RMS) is only 0.928 nm. Applying Al2O3 and TiO2 deposited in 120 oC as low and high refractive index materials, anti-reflection (AR) coating at single point (550 nm) is designed. Furthermore, with the calibrated growth rates, this AR coating is fabricated, and its ultimate reflectance for the AR coating at 550 nm is less than 0.2%, which can meet the requirement for most applications.
Wide-angle Broadband Antireflection Coatings with Nano-Taper Hydrated Alumina Film.

Hailan Wang,Chenying Yang,Yusi Wang,Wenjia Yuan,Tingting Zheng,Xiao Chen,Yujie Liu,Yueguang Zhang,Weidong Shen

DOI: https://doi.org/10.1364/oe.464327

IF: 3.8

2022-01-01

Optics Express

Abstract:Wide-angle and broadband antireflection (AR) coating is of the essence in modern optical systems in many fields, which has a great influence on the stray light and imaging quality. A simple and convenient manufacturing method is proposed to address this issue based on a composite coating combining the nano-tapered Al2O3•xH2O (AH) structure and high-low index thin film stack. The optical properties of nano-tapered AH structure at various thickness are first studied and modeled in optics by several homogeneous sub-layers with the graded equivalent index. The designed composite AR coatings are manufactured by vacuum deposition and wet etching subsequently in the hot deionized water. Compared to the common dielectric multilayer antireflection stack, the composite coating presents excellent AR performance. The measured average reflectance values of the double-side coated BK7 glass are as low as 0.40%, 0.41%, 0.56% and 3.13% in 400-1100nm band at angles of incidence (AOI) of 6°, 20°, 40°, and 60°, respectively, while the measured average transmittance at normal incidence increases up to 99.3%. Finally, the process reproductivity, environmental reliability test including long term storage, high temperature annealing and 85°C-85% relative humidity storage of the composite coatings are evaluated. The proposed AR scheme provides a low-cost, efficient, wide-angle and broadband AR coating for kinds of large-curvature components and complex surfaces in fields of consumer electronics, automotive, security, etc.
Fabrication of Anti-reflecting Si Nano-structures with Low Aspect Ratio by Nano-sphere Lithography Technique

Shenghua Sun,Peng Lu,Jun Xu,Ling Xu,Kunji Chen,Qimin Wang,Yuhua Zuo

DOI: https://doi.org/10.1007/bf03353727

IF: 26.6

2013-01-01

Nano-Micro Letters

Abstract:Nano-structured photon management is currently an interesting topic since it can enhance the optical absorption and reduce the surface reflection which will improve the performance of many kinds of optoelectronic devices, such as Si-based solar cells and light emitting diodes. Here, we report the fabrication of periodically nano-patterned Si structures by using polystyrene nano-sphere lithography technique. By changing the diameter of nano-spheres and the dry etching parameters, such as etching time and etching power, the morphologies of formed Si nano-structures can be well controlled as revealed by atomic force microscopy. A good broadband antireflection property has been achieved for the formed periodically nano-patterned Si structures though they have the low aspect ratio (<0.53). The reflection can be significantly reduced compared with that of flat Si substrate in a wavelength range from 400 nm to 1200 nm. The weighted mean reflection under the AM1.5 solar spectrum irradiation can be as low as 3.92% and the corresponding optical absorption is significantly improved, which indicates that the present Si periodic nano-structures can be used in Si-based thin film solar cells.
Fabrication of GaAs Nanowires by Colloidal Lithography and Dry Etching

Ke Chen,Mingyu Li,Jian-Jun He,Ray LaPierre

DOI: https://doi.org/10.1088/0256-307x/29/3/036105

2011-01-01

Abstract:A method for the fabrication of large-area well-ordered periodic GaAs nanowires have been developed based on colloidal lithography and a two-step inductively coupled plasma (ICP) etching. The reflectance spectra of the GaAs nanowire samples are measured and compared with nanowires fabricated by using molecular beam epitaxy.
Optical Characteristics of Gaas Nanowire Solar Cells

Y. Hu,R. R. LaPierre,M. Li,K. Chen,J. -J. He

DOI: https://doi.org/10.1063/1.4764927

IF: 2.877

2012-01-01

Journal of Applied Physics

Abstract:The reflectance, transmittance, and absorptance of GaAs nanowire (NW) arrays are calculated by solving Maxwell's equations using the finite element method. The model is compared with measurement results from well-ordered periodic GaAs NW arrays fabricated by dry etching. The model results are also compared with the reflectance measured from NWs grown by the Au-assisted vapor-liquid-solid method. The optimum NW diameter, periodicity (spacing between NWs), and length are determined to maximize absorptance of the AM1.5G solar spectrum and short circuit current density in a NW array solar cell. The optimum NW diameter, period, and length were 180 nm, 350 nm, and 5 μm, respectively, giving a photocurrent density from the NW of 27.3 mA/cm2 and corresponding to 91.3% absorption of the AM1.5 G solar spectrum. The photocurrent density saturated for NW lengths greater than 5 μm. A gold nanoparticle at the top of the NWs (used in the vapor-liquid-solid NW growth process) substantially reduced the optimum photocurrent density, while a polymer filling the space between NWs and a planar indium tin oxide contact had a relatively minor influence.
Integration of Subwavelength Optical Nanostructures for Improved Antireflection Performance of Mechanically Flexible GaAs Solar Cells Fabricated by Epitaxial Lift-off

Xiaohan Li,Ping-Chun Li,Li Ji,Christopher Stender,Sudersena Rao Tatavarti,Kimberly Sablon,Edward T. Yu

DOI: https://doi.org/10.1016/j.solmat.2015.08.006

IF: 6.9

2015-01-01

Solar Energy Materials and Solar Cells

Abstract:We demonstrate the integration of subwavelength moth-eye and Al2O3 nanoisland structures fabricated on polymer packaging sheets and the surface of conventional Al2O3/TiO2 bilayer antireflection coatings, respectively, with epitaxial lift-off single-junction GaAs solar cells. The mechanically flexible cell structure with the integrated optical nanostructures shows substantially improved photovoltaic performance under various incident angles and bending radii compared to devices without such structures: the increase in short-circuit current density arising from integration of these nanostructures ranges from 9% at normal incidence to 52% at 80° incidence; and the reduction in short-circuit current density under moderate bending decreases from 9.7% to 6.7%.
Optimal design of an antireflection coating structure for enhancing the energy-conversion efficiency of a silicon nanostructure solar cell

Qiaoyun Fan,Zhiqiang Wang,Yanjun Cui

DOI: https://doi.org/10.1039/c8ra03730b

IF: 4.036

2018-01-01

RSC Advances

Abstract:We introduced ICP method for two kinds of Si-cell arrays: silicon nanocones and nanopillars. Silicon nanowire arrays were prepared by the Ag-assisted chemical etching method. We experimentally demonstrated the J – V characterization of three structures.

chemistry, multidisciplinary
Numerical modelling of Zinc Oxide nanowire anti reflective coatings

Waranatha Abeygunasekara,Lilantha Samaranayake,Veranja Karunaratne,Pritesh Hiralal,G.A.J. Amaratunga

DOI: https://doi.org/10.1109/ICIINFS.2015.7399018

2015-01-01

Abstract:Zinc Oxide (ZnO) nanowire anti-reflective coating is modelled using wave optics methods, solving the Maxwell's equation numerically using commercially available finite element software. The model is used to investigate the effectiveness of the anti-reflective coating at air-glass interface. ZnO nanowires of both uniform and tapering cross sections are investigated, and reflection coefficient is calculated for incident angles of 0–90 degrees. Simulations are done for the wavelength range 300“800 nm considering the wavelength dependent optical properties of ZnO nanowires. With average diameter of 50 nm and height of 400 nm the simulated nanowires confirm to dimensions of low temperature hydrothermally grown nanowires. At normal incidence, tapered nanowires can reduce the reflections to 1.5% and uniform nanowires can reduce the reflections to 3%. Without an anti-reflection coating, reflections amount to about 4% at air-glass interface. Tapering nanowires which take in to account the graded refractive index effect due to density gradient of the nanowires are far more effective at higher incident angles. Tapered nanowires keep the reflections well below 12% for all the practical angles of incidences whereas without the anti-reflection coatings the reflections reach as high as 50%. The density gradient and packing density of the nanowires are varied to optimize the nanowire array for the particular wavelength range considered. The wavelength range considered for simulations includes the absorption bands of most commonly used absorbers employed in organic solar cells. Thus simulated properties of the anti-reflection coating is highly relevant for organic solar cells.
Integrated optical nanostructures for wide-angle antireflection and light trapping in III/V solar cells

xiaohan li,pingchun li,li ji,dongzhi hu,d m schaadt,christopher l stender,claiborne mcpheeters,rao tatavarti,k a sablon,e t yu

DOI: https://doi.org/10.1109/PVSC.2014.6925371

2014-01-01

Abstract:The use of subwavelength-scale dielectric nanostructures for both reduced surface and interface reflectance and long-wavelength light trapping in III/V thin-film solar cells is demonstrated and characterized. Antireflection coatings incorporating submicron pyramidal “nanoislands” are fabricated on GaAs thin-film solar cells using a low-cost nanosphere lithography (NSL) process, and shown to improve external quantum efficiency (E.Q.E.) compared to that achieved using a thin-film planar Al2O3/TiO2 antireflection coating, with the largest improvements occurring for large angles of incidence. Such structures are also shown to enable, simultaneously, reduced surface reflectance and long-wavelength light trapping, as demonstrated in GaAs/InGaAs quantum well solar cells. Finally, the simultaneous use of subwavelength “moth-eye” structures fabricated in polymer packaging material using NSL and solar cell antireflection structures incorporating dielectric “nanoislands” is demonstrated and analyzed, enabling increases in short-circuit current density of ~1.1× to 1.67×, depending on angle of incidence, compared to structures using conventional two-layer thin-film antireflection coatings and unpatterned polymer packaging.
Anti-reflection effect of large-area ZnO nano-needle array on multi-crystalline silicon solar cells

Meihuizi Wang,Haiyan He,Chunhui Shou,Hao Cui,Deren Yang,Lei Wang

DOI: https://doi.org/10.1016/j.mssp.2021.106299

IF: 4.1

2022-01-01

Materials Science in Semiconductor Processing

Abstract:The current diamond-wire-sawed multi-crystalline silicon wafer lacks an effective light trapping structure, which results in high reflectivity and hinders the improvement of efficiency. In this work, we proposed an enhanced light trapping structure outside the junction of multi-crystalline silicon solar cells, that is, constructing a ZnO nano-needle array on the surface of the textured multi-crystalline silicon to minimize the reflection in the visible-near infrared band to achieve light trapping effect. Solar cells with ZnO nano-needle structure exhibit excellent light trapping performance over a wide band (350-1100 nm). The low-cost and simple preparation method makes this enhanced light trapping structure has broad application prospects.
Wafer-scale high anti-reflective nano/micro hybrid interface structures via aluminum grain dependent self-organization

Tangyou Sun,Yun Liu,Jie Tu,Zhiping Zhou,Le Cao,Xingpeng Liu,Haiou Li,Qi Li,Tao Fu,Fabi Zhang,Zhiqiang Yu

DOI: https://doi.org/10.1016/j.matdes.2020.108960

2020-09-01

Abstract:<p>Surface anti-reflection (AR) with micrometer or nanometer scaled surface texture has been studied extensively and showed excellent light extraction (or harvest) performance in corresponding opto-electronic devices. In this paper, a 2-inch anodized aluminum oxide (AAO) template with nano/micro hybrid structure was obtained directly through a simple lithography-free aluminum anodization process for the first time. This new nano/micro hybrid structure combines the advantages of sub-100 nm sub-wavelength structure (SWS) and micrometer scaled surface roughening. Aluminum grains were found to rearrange the distribution of the penetrated surface current during the anodization and eventually induced the micrometer scaled fluctuation underneath. The ultra-thin AAO replication scheme was introduced to fabricate and study the spectrum (300 nm to 800 nm) dependent AR performance of the nano/micro hybrid PDMS structure, which obtained an AR enhancement fraction of more than 42% higher than that of the nano-patterned one. Thin film and GaN based light-emitting diode (LED, 450 nm) models were built and studied. Compared to the flat LED, the AR enhancement of the nano/micro structured one can reach as high as more than 3 folds. These results suggest the nano/micro hybrid structure could be a good alternative for the applications of surface AR structure.</p>

materials science, multidisciplinary
Improved antireflection properties and optimized structure for passivation of well-separated, vertical silicon nanowire arrays for solar cell applications

zewen zuo,kai zhu,guanglei cui,wanxia huang,jun qu,yi shi,yousong liu,guangbin ji

DOI: https://doi.org/10.1016/j.solmat.2014.03.026

IF: 6.9

2014-01-01

Solar Energy Materials and Solar Cells

Abstract:Large-area, well-separated, and vertically aligned silicon nanowire (SiNW) arrays with excellent antireflection properties were fabricated through a combination of anodic aluminum oxide template and metal-assisted chemical etching, followed by supercritical drying. Less than 1% reflectance was achieved over the wavelength range of 200–600nm, and 23% reduction in average reflectance was observed over the 200–1000nm range, compared with the conical-frustum structure array by natural drying. Furthermore, the well-separated SiNW arrays considerably facilitated the conformal coating of the plasma-enhanced chemical vapor deposited amorphous silicon layer on the SiNW surface, which could result in effective passivation of surface states. Therefore, such well-separated and vertically aligned SiNW arrays are highly promising for solar cell application.
Hexagonal Arrays Of Round-Head Silicon Nanopillars For Surface Anti-Reflection Applications

Wensheng Yan,Stephan Dottermusch,Christian Reitz,Bryce S. Richards

DOI: https://doi.org/10.1063/1.4963912

IF: 4

2016-01-01

Applied Physics Letters

Abstract:We designed and fabricated an anti-reflection surface of hexagonal arrays of round-head silicon nanopillars. The measurements show a significant reduction in reflectivity across a broad spectral range. However, we then grew a conformal titanium dioxide coating via atomic layer deposition to achieve an extremely low weighted average reflection of 2.1% over the 460-1040 nm wavelength range. To understand the underlying reasons for the reduced reflectance, the simulations were conducted and showed that it is due to strong forward scattering of incident light into the silicon substrate. The calculated normalized scattering cross section demonstrates a broadband distribution feature, and the peak has a red-shift to longer wavelengths. Finally, we report two-dimensional weighted average reflectance as a function of both wavelength and angle of incidence and present the resulting analysis contour map. Published by AIP Publishing.
High Anti-Reflection Large-Scale Cup-Shaped Nano-Pillar Arrays via Thin Film Anodic Aluminum Oxide Replication

Tangyou Sun,Furong Shui,Xiancui Yang,Zhiping Zhou,Rongqiao Wan,Yun Liu,Cheng Qian,Zhimou Xu,Haiou Li,Wenjing Guo

DOI: https://doi.org/10.3390/nano12111875

IF: 5.3

2022-05-30

Nanomaterials

Abstract:Surface anti-reflection (AR) with nanometer-scaled texture has shown excellent light trapping performance involving optical devices. In this work, we developed a simple and lithography-free structure replication process to obtain large scale surface cup-shaped nano-pillar (CSNP) arrays for the first time. A method of depositing was used for pattern transfer based on PMMA pre-coated through-hole anodic aluminum oxide (AAO) thin film (~500 nm), and eventually, the uniformity of the transferred nanostructures was guaranteed. From the spectrum (250 nm~2000 nm) dependent measurements, the CSNP nanostructured Si showed excellent AR performance when compared with that of the single-polished Si. Moreover, the CSNP was found to be polarization insensitive and less dependent on incidence angles (≤80°) over the whole spectrum. To further prove the excellent antireflective properties of the CSNP structure, thin film solar cell models were built and studied. The maximum value of Jph for CSNP solar cells shows obvious improvement comparing with that of the cylinder, cone and parabola structured ones. Specifically, in comparison with the optimized Si3N4 thin film solar cell, an increment of 54.64% has been achieved for the CSNP thin film solar cell.

materials science, multidisciplinary,physics, applied,nanoscience & nanotechnology,chemistry
Morphology-dependent high antireflective surfaces via anodic aluminum oxide nanostructures

Haiou Li,Le Cao,Tao Fu,Qi Li,Fabi Zhang,Gongli Xiao,Yonghe Chen,Xingpeng Liu,Wenning Zhao,Zhiqiang Yu,Zhiping Zhou,Tangyou Sun

DOI: https://doi.org/10.1016/j.apsusc.2019.143697

IF: 6.7

2019-12-01

Applied Surface Science

Abstract:<p>High density honeycombed nano-pattern of anodic aluminum oxide (AAO) is of great use to various high-performance optoelectronic devices due to its non-lithographic and excellent sub-wavelength structure (SWS) anti-reflection (AR) properties. In this paper, we introduce an ultra-thin AAO based bilayer polydimethylsiloxane (PDMS) scheme to simply replicate and obtain regular triangle-like surface nano-pillar array with a period of 125 nm, which shows a 5% to 27% AR enhancement under the light wavelength ranging from 250 nm to 850 nm. In order to investigate the intrinsic property of AAO nano-structure based light extraction properties, gallium nitride (GaN) light-emitting models are built. Compared to the bare GaN, the maximum AR enhancements of low ordered AAO array, regular array and high ordered AAO array are respectively 20.2%, 22.0% and 23.5%. Grain size effect is found to further improve the AR performance of the high ordered AAO array and the effective refractive index based thin film model demonstrates a success in AAO pattern-dependent surface AR analysis. Besides, by tailoring the side-wall profile, a further AR enhancement (e.g. 39.1%) can be obtained because of a smoothly changing of the refractive index along the height direction.</p>

chemistry, physical,physics, applied, condensed matter,materials science, coatings & films
Micro/nano structure size effect on superhydrophobicity and anti reflection of single crystalline Si solar cells

Yan Liu,Yonghao Xiu,Wong, C.P.

DOI: https://doi.org/10.1109/ECTC.2010.5490743

2010-01-01

Abstract:Si surface modification is of great significance for a variety of applications, such as hydrophobic treatment, surface passivation of photovoltaic devices, and microelectronic devices. In this study, a facile way of forming superhydrophobic surfaces is reported that uses KOH etching and Au assisted HF/H2O2 etching of silicon wafers. The Au layer was deposited onto a pyramidal silicon wafer via e-beam evaporation. By controlling the evaporation and etching times, the effect of micro/nano scale roughness was manipulated and superhydrophobic surfaces with reduced hysteresis were generated. Light reflection on the as prepared black surfaces was measured to assess the efficiency for low cost solar cell applications. The two scale roughness surface showed a much reduced reflectance compared to that of pyramid textured silicon surfaces which are commonly employed in high efficiency solar cells. The effect of micro/nano size on light reflection properties was also studied. This approach offers a new way both to theoretically study the surface roughness effect and to investigate engineering applications of self-cleaning surfaces in solar cells. Such surface could also be applied in plastic packaging of IC device.

Optimization of Anti-Reflective GaAs Nano-Rods on Solar Cells

Low Reflectance Gaas Nano-Cones Fabricated By Colloidal Lithography For Solar Cells

Design and analysis of one-dimensional nanostructure on amorphous silicon solar cell for surface reflectance reduction

Optimization of GaAs Nanowire Array for Solar Cells

Wide-angle Broadband Antireflection with Nano-taper Hydrated Alumina Film

Anti-reflection Coating at 550 Nm Fabricated by Atomic Layer Deposition

Wide-angle Broadband Antireflection Coatings with Nano-Taper Hydrated Alumina Film.

Fabrication of Anti-reflecting Si Nano-structures with Low Aspect Ratio by Nano-sphere Lithography Technique

Fabrication of GaAs Nanowires by Colloidal Lithography and Dry Etching

Optical Characteristics of Gaas Nanowire Solar Cells

Integration of Subwavelength Optical Nanostructures for Improved Antireflection Performance of Mechanically Flexible GaAs Solar Cells Fabricated by Epitaxial Lift-off

Optimal design of an antireflection coating structure for enhancing the energy-conversion efficiency of a silicon nanostructure solar cell

Numerical modelling of Zinc Oxide nanowire anti reflective coatings

Integrated optical nanostructures for wide-angle antireflection and light trapping in III/V solar cells

Anti-reflection effect of large-area ZnO nano-needle array on multi-crystalline silicon solar cells

Wafer-scale high anti-reflective nano/micro hybrid interface structures via aluminum grain dependent self-organization

Improved antireflection properties and optimized structure for passivation of well-separated, vertical silicon nanowire arrays for solar cell applications

Hexagonal Arrays Of Round-Head Silicon Nanopillars For Surface Anti-Reflection Applications

High Anti-Reflection Large-Scale Cup-Shaped Nano-Pillar Arrays via Thin Film Anodic Aluminum Oxide Replication

Morphology-dependent high antireflective surfaces via anodic aluminum oxide nanostructures

Micro/nano structure size effect on superhydrophobicity and anti reflection of single crystalline Si solar cells