Low Reflectance Gaas Nano-Cones Fabricated By Colloidal Lithography For Solar Cells

Nan Liu,Yu Hu,Jian-Jun He
2014-01-01
Abstract:In this paper, we demonstrate a new method of fabricating large-area well-ordered nano-cones using colloidal lithography and inductively coupled plasma (ICP) dry etching, and discuss the anti-reflectance performance. In the fabrication, we use SiO2 nano-particles as the mask. Its selectivity in different reacting gases in ICP can result in different shapes of nanostructures. Before the etching, we use methanol-assisted self-assembly at the air/water interface to form the patterns. Different ICP etching recipes are used to form rod-shaped and cone-shaped nanowires with the same height and period. The resultant nano-cone structures are well-shaped with smooth side walls. After the fabrication, the anti-reflection performance is measured and compared, which shows that cone-shaped nanowires can reduce the surface reflection to lower than 4% over the wavelength range of 400-900 nm, while nano-rods can only keep this value at approximately 6%. Theoretical simulations are also carried out using Comsol, which confirm that nano-cones provide better anti-reflectance performance.
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