Thermal Resistance Evaluation of a Low-Inductance Double-Stacked SiN-AMC Substrate for a High-Temperature Operation SiC Power Module

Fumiki Kato,Shinji Sato,Hidekazu Tanisawa,Kenichi Koui,Kinuyo Watanabe,Yoshinori Murakami,Hiroshi Yamaguchi,Hiroshi Sato
DOI: https://doi.org/10.1149/08612.0107ecst
2018-07-23
ECS Transactions
Abstract:Two silicon nitride active metal brazed copper (SiN-AMC) substrates are double stacked and bonded to generate a five-layer structure that reduces the parasitic inductance of a power module. To investigate the heat dissipation characteristics of the double-stacked SiN-AMC substrates, the thermal resistance is measured using transient thermal analysis. The thermal resistance of each test vehicle is analyzed, and the thermal resistance of the SiN-AMC substrate is extracted. Further, the thermal resistance of the double-stacked SiN-AMC with a 0.3-mm thick Cu film is observed to be lower than the thermal resistance of a single SiN-AMC with a 0.1-mm thick Cu film. For a 3-mm square SiC die size, we observe that increasing the Cu film thickness is more effective to reduce the thermal resistance of the double-stacked SiN-AMC module as compared to increasing the SiN thermal conductivity.
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