Impurity Gettering by Boron‐ and Phosphorus‐Doped Polysilicon Passivating Contacts for High‐Efficiency Multicrystalline Silicon Solar Cells

Maxim Hayes,Benoit Martel,Giri Wahyu Alam,Hélène Lignier,Sébastien Dubois,Etienne Pihan,Olivier Palais
DOI: https://doi.org/10.1002/pssa.201900321
2019-07-17
physica status solidi (a)
Abstract:<p>Highly doped polysilicon (poly‐Si) on ultra‐thin oxide layers are highlighted as they allow both efficient carrier collection with low contact resistivity and excellent surface passivation. Their integration at the rear surface of a high quality single‐crystalline silicon solar cells allowed to achieve a record conversion efficiency of 25.7% for a double‐side contacted device. However, so far only a very few studies investigate the interactions between poly‐Si passivating contacts and lower quality but cheaper silicon wafers. Thus, this paper focuses on the external gettering response of both boron (B) and phosphorus (P) <i>in situ</i> doped poly‐Si passivating contacts on high performance multicrystalline silicon. Wafers are extracted from five ingot heights and experience P‐ and B‐doped poly‐Si passivating contact fabrication processes. The bulk carrier lifetime and interstitial iron (Fe<sub>i</sub>) concentration are then characterized and compared to conventional POCl<sub>3</sub> and BCl<sub>3</sub> thermal diffusion steps, and to as‐cut references. The P doped poly Si contact fabrication process results in gettering more than 99% of the Fe<sub>i</sub>, which leads to an important increase of the bulk carrier lifetime. Interestingly, the B‐doped poly Si contact also develops a substantial external gettering action, and allows removing 96% of the Fe<sub>i</sub> from the bulk.</p><p>This article is protected by copyright. All rights reserved.</p>
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