Shape transition of InAs quantum dots by growth at high temperature

Hideaki Saito,Kenichi Nishi,Shigeo Sugou
DOI: https://doi.org/10.1063/1.123506
IF: 4
1999-03-01
Applied Physics Letters
Abstract:The shape of InAs quantum dots grown on GaAs substrates by molecular beam epitaxy is investigated at various growth temperatures. A dot with a new shape surrounded by {110} facets and having a high aspect ratio appears at temperatures over 510 °C. This dot is transformed from a pyramid shape (low aspect ratio) when its volume exceeds a critical value by raising the growth temperature. The shape transition indicates that the high-aspect-ratio dot is energetically favorable at a large volume. A narrow energy width of photoluminescence, 35 meV at room temperature, is obtained by the growth of the high-aspect-ratio dots, which have a fairly good size uniformity of less than 4% deviation.
physics, applied
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