Influence of O2 Pulse on the Β-Ga2o3 Films Deposited by Pulsed MOCVD
Tao Zhang,Yifan Li,Qian Cheng,Zhiguo Hu,Jinbang Ma,Yixin Yao,Yan Zuo,Qian Feng,Yachao Zhang,Hong Zhou,Jing Ning,Chunfu Zhang,Jincheng Zhang,Yue Hao
DOI: https://doi.org/10.1016/j.ceramint.2021.12.031
IF: 5.532
2022-01-01
Ceramics International
Abstract:beta-Ga2O3 films were deposited on c-plane sapphire substrates by pulsed MOCVD, and the TEGa and O-2 were alternately delivered to the reactor as two pulses. During the growth process, the Ga pulse was kept at 0.1 min, and the O-2 pulse was set at 0.1, 0.2 and 0.3 min, respectively. XRD showed that the beta-Ga2O3 films still grew preferentially along the (-201) crystal plane family, and no other crystal orientations were observed. The beta-Ga2O3 films had uniform surface morphology, and grain size increased slightly with the increasing O-2 pulse. XRD rocking curves indicated that the beta-Ga2O3 film deposited at 0.2 min pulse of O-2 had the best crystalline quality. The PL spectra of all beta-Ga2O3 films presented the broad UV-visible photoluminescence region from 250 to 800 nm. Three obvious main photoluminescence peaks were observed, corresponding to UV, blue and green emission, respectively. Photodetector was fabricated from the beta-Ga2O3 film deposited at 0.2 min pulse of O-2, showing stable photoelectric performance, and the photo-dark current ratio was as high as 1.7 x 10(5) at 15 V.