Abstract:In this work, the effect of the deposition parameters of a magnetron sputtered Ti adhesive intermediate layer on the morphology and hydrogen absorption properties of thin Pd films of about 100 nm was investigated. The insertion of an adhesive layer between a Pd film and a rigid substrate usually suppresses or reduces hydrogen absorption. In this study, it is shown that by tuning the surface topography of the intermediate layer the morphology, crystallographic texture and hydrogen absorption properties of the Pd film can be controlled. The surface topography of the Ti layer was characterized using atomic force microscopy. The surface topography strongly depends on the Ti deposition conditions and can vary from widely spread large islands to densely packed small-grained islands depending on thickness (between 1 and 6 nm) and sputter pressure (0.4 and 3 Pa). TEM and XRD analysis led to the conclusion that rough Ti intermediate layers result in Pd films with an open columnar structure with small voids, and a weak and broad (111) texture. Smooth Ti intermediate layers promote the formation of Pd films with a dense columnar structure with fewer voids, and a strong and sharp (111) texture. Changes in the Pd adatom surface diffusion and shadowing effects are the main cause of the observed differences. Pd films with an open columnar morphology and weaker texture show better hydrogen absorption properties with respect to absorption capacity and kinetics of the films with dense columnar morphology. By tuning the surface topography of the Ti adhesive layer, Pd films with controlled morphology and texture can be prepared such that no delamination from the substrate occurs without compromising on absorption properties.

Hydrogen permeation through PECVD (plasma-enhanced chemical vapor deposition) TiO2 film on Pd by the time lag method

Contamination resistance of Pd coated Ti thin film in hydrogen absorption

Structural Investigation And Barrier Properties Of A-C : H Thin Films On Polymer By Pecvd

Surface Electronic Properties of Discontinuous Pd Films During Hydrogen Exposure

High vapour barrier thin films deposited by R.F.-discarge plasma enhanced CVD

Electrochemical Detection of Hydrogen Peroxide at the Sputtered Titanium Oxide Electrode

The Study of Pd Film Layer Deposited on Surface of Pure Titanium by Arc Ion Plating Technology

Hydrogen interaction with Pd/SiO2/Si rectifying junction

The effect of Pd and Ni coatings on hydrogen permeation experiments of as-quenched martensitic steel

Hydrogen Efficient Sensor Based on Schottky Barrier Diode of the Point Contact Between Pdxo Decorated TiO2 Nanotube Arrays

Hydrogen-Induced Effect on Device Performance of a Pd/GaAs-Based Heterostructure Field-Effect Transistor

Electroanalytical Probing of Triphasic Hydrogen Storage and Transport in Films of Nanoparticulate Polymer of Intrinsic Microporosity (PIM-1)

Electrochemical Degradation of the Hydrogen-Absorption-Induced Passive Film on an Ni–Ti Superelastic Alloy in an NaCl Solution

Preparation and Hydrogen Penetration Performance of TiO2/TiCx Composite Coatings

Controlling morphology and texture of sputter-deposited Pd films by tuning the surface topography of the (Ti) adhesive layer

Oxygen Defects Containing TiN Films for the Hydrogen Evolution Reaction: A Robust Thin-Film Electrocatalyst with Outstanding Performance

Porosity-dependent photoelectrochemical activity of double-layered TiO2 thin films deposited by spin-coating method

Considerable Hydrogen Permeation Behavior Through A Dense Ce0.8sm0.2o2-Delta (Sdc) Asymmetric Thick Film

Impedance Characteristic of a photocatalytic TiO2 films and its application

Hydrogen related defects in titanium dioxide at the interface to palladium

Pd–Ni Thin Films Grown on Porous Al 2 O 3 Substrates by Metalorganic Chemical Vapor Deposition for Hydrogen Sensing