The Study of Pd Film Layer Deposited on Surface of Pure Titanium by Arc Ion Plating Technology

Li Zhengxian,Zhang Yuefei,Wang Baoyun,Wang Shaopeng,Yan Peng,Xu Zhong
DOI: https://doi.org/10.3321/j.issn:1002-185x.2007.12.019
2007-01-01
Rare Metal Materials and Engineering
Abstract:I'd film was deposited on the surface of pure titanium using welding complex I'd target by arc ion plating(AIP). SEM, XRD and micro-hardness gauge were employed to characterieze Pd film. The results indicate that Pd film exhibits the typical characteristics of AIP deposition process. The film is dense, and its thickness is 1.2 similar to 2 mu m. The Ti4Pd phase was formed between Pd film and Ti substrate at deposition temperature of 600 degrees C. The surface micro-hardness of film is about 2 GPa. The micro-hardness of the inner layer between the film and the substrate is 2.8 GPa owing to Ti4Pd phase formation in the layer.
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