Enhanced performance of (112 ̄2) plane p-AlGaN grown with indium surfactant

Qian Dai,Xiong Zhang,Zili Wu,Qian Dai,Xiong Zhang,Zili Wu
DOI: https://doi.org/10.1016/j.matlet.2022.132675
IF: 3
2022-10-01
Materials Letters
Abstract:Indium (In) surfactant was applied during the growth process to improve the properties of the (112 ̄2) plane p-Al0.21Ga0.79N films. The characterization results demonstrated that the crystal quality of the (112 ̄2) plane p-AlGaN could be ameliorated with In surfactant. Meanwhile, the surface morphology as well as the hole concentration of the p-AlGaN films could be enhanced remarkably by optimizing the flow rate of TMIn. In particular, a maximum hole concentration of 4.8 × 1017 cm−3 was obtained for the p-AlGaN epi-layer when the TMIn flow rate was 1.12μ mol/min, which was increased by 3 times compared to that for the epi-layer grown without In surfactant.
materials science, multidisciplinary,physics, applied
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