Effects of indium surfactant on growth and characteristics of (112¯2) plane AlGaN-based multiple quantum wells

Qian Dai,Xiong Zhang,Zongwen Liang,Gang Yang,Zili Wu,Shuai Chen,Jianguo Zhao,Caimin Meng,Jianlu Wang,Yiping Cui
DOI: https://doi.org/10.1364/OME.8.000024
2018-01-01
Optical Materials Express
Abstract:High quality semi-polar (11 (2) over bar2) plane AlGaN-based multiple quantum wells (MQWs) were successfully grown on (10 (1) over bar0) m-plane sapphire substrates with metal-organic chemical vapor deposition (MOCVD) technology and the effects of indium (In) surfactant on the structural and optical properties of the AlGaN-based MQWs were investigated intensively. The characterization results revealed that the surface morphology as well as the crystalline quality for the semi-polar (11 (2) over bar2) plane AlGaN MQWs could be improved remarkably by adopting In as surfactant during the MOCVD growth process. Furthermore, the integrated MQWs-related excition emission peak intensity and the radiative recombination probabilities in MQWs could be increased as well with the help of Insurfactant, resulting an enhanced internal quantum efficiency. (c) 2017 Optical Society of America under the terms of the OSA Open Access Publishing Agreement
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