THE PROCESSING EFFECTS ON STRUCTURE AND PROPERTIES OF SOL-GEL DERIVED PLZT FERROELECTRIC THIN FILMS

Xiaowen Zhang,Peiyu Yan
1995-01-01
Abstract:PLZT thin films with good ferroelectric properties were fabricated using the sol-gel method on platinized silicon.The processing parameters affecting the microstructure and electric properties of thin films were investigated. Suitable concentration and hydrolysis degree of precursor and low heating rate eliminate cracking of thin films.PbTiO3 transition layer enhances the nucleation of PLZT thin film and crystallization of single Perovskite phase.The low remnant polarization Pr(9.3μC.cm-2)and high coercive field Ec(50kV'cm-1)of thin films are caused by presence ofpbTiO3 transition layer,small grains in the film and space charges presenting between the grains.
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