Demonstration of 1200-V E-mode GaN-on-Sapphire Power Transistor with Low Dynamic ON-Resistance Based on Active Passivation Technique

Jiawei Cui,Maojun Wang,Yanlin Wu,Junjie Yang,Han Yang,Jingjing Yu,Teng Li,Xuelin Yang,Xiaosen Liu,Kai Cheng,Jinyan Wang,Bo Shen,Jin Wei
DOI: https://doi.org/10.1109/led.2023.3341413
IF: 4.8157
2023-01-01
IEEE Electron Device Letters
Abstract:This letter demonstrates a 1200-V E-mode GaN-on-sapphire power transistor based on active passivation technique. The active passivation concept utilizes a thin p-GaN layer extending from the p-GaN gate towards near the drain to screen the surface traps. The fabricated active-passivation HEMT (AP-HEMT) with L-GD of 27 mu m exhibits a low RON of 16.9 Omega & sdot; mm, corresponding to a specific R-ON (R-ON,R- SP) of 6.42 m Omega & sdot; cm(2). A breakdown voltage (BV) over 2000 V is obtained for the AP-HEMT. Besides, the AP-HEMT showcased excellent dynamic performance due to the surface shielding effect provided by the active passivation. Dynamic ON-resistance was characterized 120 mu s after a 10-ms VDS-OFF stress. At VDS-OFF = 1200 V, the ratio of dynamic R-ON to static R-ON is 1.09. The results highlight the superior capabilities of active passivation technique for 1200-V GaN power transistors.
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