Abstract:Nanostructures with sufficiently large areas are necessary for the development of practical devices. Current efforts to fabricate large-area nanostructures using step-and-repeat nanoimprint lithography, however, result in either wide seams or low efficiency due to ultraviolet light leakage and the overflow of imprint resin. In this study, we propose an efficient method for large-area nanostructure fabrication using step-and-repeat nanoimprint lithography with a composite mold. The composite mold consists of a quartz support layer, a soft polydimethylsiloxane buffer layer, and multiple intermediate polymer stamps arranged in a cross pattern. The distance between the adjacent stamp pattern areas is equal to the width of the pattern area. This design combines the high imprinting precision of hard molds with the uniform large-area imprinting offered by soft molds. In this experiment, we utilized a composite mold consisting of three sub-molds combined with a cross-nanoimprint strategy to create large-area nanostructures measuring 5 mm × 30 mm on a silicon substrate, with the minimum linewidth of the structure being 100 nm. Compared with traditional step-and-flash nanoimprint lithography, the present method enhances manufacturing efficiency and generates large-area patterns with seam errors only at the micron level. This research could help advance micro-nano optics, flexible electronics, optical communication, and biomedicine studies.

A Low-Cost Fabrication Method for High Aspect Ratio Nano-Channels by Near-Field UV Exposure and Thermal Nanoimprinting

Simple and Cost-Effective Fabrication of Two-Dimensional Plastic Nanochannels from Silica Nanowire Templates

Fabrication of High Aspect Ratio Nano-Channels by Thermal Nano-Imprinting and Parylene Deposition

Wafer-scale Fabrication of High-Aspect Ratio Nanochannels Based on Edge-Lithography Technique.

Fabrication of sub-50 nm nanochannel array by an angle forming lift-off method

Fabrication of nanochannels using underexposed nanoimprint method

Fabrication of 2D silicon nano-mold by side etch lift-off method

A Low-Cost and High-Efficiency Method for Four-Inch Silicon Nano-Mold by Proximity UV Exposure

A Study on the Fabrication of Nanostructures with High Aspect Ratio and Large Area Uniformity

A Low-Cost Method of Fabricating Hybrid Micro-Nano Fluidic Chip by Double-Layer PDMS Mold and UV–thermal Nanoimprinting

Fabrication of Size-Controllable Nanofluidic Channels Using Angled Physical Vapor Deposition

Fabrication of Large-Area Nanostructures Using Cross-Nanoimprint Strategy

Fabrication of Size Controllable SU-8 Nanochannels Using Nanoimprint Lithography and Low-Pressure Thermal Bonding Methods

Integrated fabrication of micro/nano-fluidic chip based on nano-imprint lithography and bonding

A low-cost fabrication method of nanostructures by ultraviolet proximity exposing lithography

Fabrication of 1-d nanochannels on PMMA substrate by photoresist-free uv lithography and UV-assisted bonding under low temperature

Fabrication of Enclosed Nanofluidic Channels by UV Cured Imprinting and Optimized Thermal Bonding of SU-8 Photoresist

A new low-cost fabrication method of SU-8 micro–nano channels and needle tip in electro-hydrodynamic jet chips

Channel resolution enhancement through scalability of nano/micro-scale thickness and width of SU-8 polymer based optical channels using UV lithography

The Fabrication of High-Aspect-ratio, Size-Tunable Nanopore Arrays by Modified Nanosphere Lithography.

A novel fabrication method of embedded micro-channels by using SU-8 thick-film photoresists