λ/12 Super Resolution Achieved in Maskless Optical Projection Nanolithography for Efficient Cross-Scale Patterning
Yu-Huan Liu,Yuan-Yuan Zhao,Feng Jin,Xian-Zi Dong,Mei-Ling Zheng,Zhen-Sheng Zhao,Xuan-Ming Duan
DOI: https://doi.org/10.1021/acs.nanolett.1c00559
IF: 10.8
2021-05-03
Nano Letters
Abstract:The emerging demand for device miniaturization and integration prompts the patterning technique of micronano-cross-scale structures as an urgent desire. Lithography, as a sufficient patterning technique, has been playing an important role in achieving functional micronanoscale structures for decades. As a promising alternative, we have proposed and demonstrated the maskless optical projection nanolithography (MLOP-NL) technique for efficient cross-scale patterning. A minimum feature size of 32 nm, which is λ/12 super resolution breaking the optical diffraction limit, has been achieved by a single exposure. Furthermore, multiscale two-dimensional micronano-hybrid structures with the size over hundreds of micrometers and the precision at tens of nanometers have been fabricated by simply controlling the exposure conditions. The proposed MLOP-NL technique provides a powerful tool for achieving cross-scale patterning with both large-scale and precise configuration with high efficiency, which can be potentially used in the fabrication of multiscale integrated microsystems.The Supporting Information is available free of charge at <a class="ext-link" href="/doi/10.1021/acs.nanolett.1c00559?goto=supporting-info">https://pubs.acs.org/doi/10.1021/acs.nanolett.1c00559</a>.Materials and methods; optical system of the maskless optical projection nanolithography system in detail; photoresist thickness characterization; mechanism of the photochemical reaction of negative photoresist AR-N 7520; UV–vis absorbance spectrum; FTIR spectra; fluorescence lifetime measurement; supplementary discussion 1, simulation of the light intensities; supplementary discussion 2, feature size comparison between polymer line and polymer dot for the same pixel exposure; supplementary discussion 3, verification of projection result as a function of pixels; design of a complex cross-scale micronanofluid device; designed pattern for batch FinFET; FinFET patterns of different parameters in an array (<a class="ext-link" href="/doi/suppl/10.1021/acs.nanolett.1c00559/suppl_file/nl1c00559_si_001.pdf">PDF</a>)This article has not yet been cited by other publications.
materials science, multidisciplinary,chemistry, physical,physics, applied, condensed matter,nanoscience & nanotechnology